Optimized design of block copolymers with covarying properties for nanolithography.
Feng H, Dolejsi M, Zhu N, Yim S, Loo W, Ma P, Zhou C, Craig GSW, Chen W, Wan L, Ruiz R, de Pablo JJ, Rowan SJ, Nealey PF.
Feng H, et al. Among authors: de pablo jj.
Nat Mater. 2022 Dec;21(12):1426-1433. doi: 10.1038/s41563-022-01392-1. Epub 2022 Nov 10.
Nat Mater. 2022.
PMID: 36357686