Tono K - Search Results

1

Radiation-Induced Chemical Dynamics in Ar Clusters Exposed to Strong X-Ray Pulses.

Kumagai Y, Jurek Z, Xu W, Fukuzawa H, Motomura K, Iablonskyi D, Nagaya K, Wada SI, Mondal S, Tachibana T, Ito Y, Sakai T, Matsunami K, Nishiyama T, Umemoto T, Nicolas C, Miron C, Togashi T, Ogawa K, Owada S, Tono K, Yabashi M, Son SK, Ziaja B, Santra R, Ueda K. Kumagai Y, et al. Among authors: tono k. Phys Rev Lett. 2018 Jun 1;120(22):223201. doi: 10.1103/PhysRevLett.120.223201. Phys Rev Lett. 2018. PMID: 29906148

2

Note: Measurement of saturable absorption by intense vacuum ultraviolet free electron laser using fluorescent material.

Inubushi Y, Yoneda H, Higashiya A, Ishikawa T, Kimura H, Kumagai T, Morimoto S, Nagasono M, Ohashi H, Sato F, Tanaka T, Togashi T, Tono K, Yabashi M, Yamaguchi Y, Kodama R. Inubushi Y, et al. Among authors: tono k. Rev Sci Instrum. 2010 Mar;81(3):036101. doi: 10.1063/1.3302542. Rev Sci Instrum. 2010. PMID: 20370224

3

Multiphoton double ionization of Ar in intense extreme ultraviolet laser fields studied by shot-by-shot photoelectron spectroscopy.

Hikosaka Y, Fushitani M, Matsuda A, Tseng CM, Hishikawa A, Shigemasa E, Nagasono M, Tono K, Togashi T, Ohashi H, Kimura H, Senba Y, Yabashi M, Ishikawa T. Hikosaka Y, et al. Among authors: tono k. Phys Rev Lett. 2010 Sep 24;105(13):133001. doi: 10.1103/PhysRevLett.105.133001. Epub 2010 Sep 21. Phys Rev Lett. 2010. PMID: 21230767

4

Single-shot beam-position monitor for x-ray free electron laser.

Tono K, Kudo T, Yabashi M, Tachibana T, Feng Y, Fritz D, Hastings J, Ishikawa T. Tono K, et al. Rev Sci Instrum. 2011 Feb;82(2):023108. doi: 10.1063/1.3549133. Rev Sci Instrum. 2011. PMID: 21361574

5

Observation of free-electron-laser-induced collective spontaneous emission (superfluorescence).

Nagasono M, Harries JR, Iwayama H, Togashi T, Tono K, Yabashi M, Senba Y, Ohashi H, Ishikawa T, Shigemasa E. Nagasono M, et al. Among authors: tono k. Phys Rev Lett. 2011 Nov 4;107(19):193603. doi: 10.1103/PhysRevLett.107.193603. Epub 2011 Nov 1. Phys Rev Lett. 2011. PMID: 22181606

6

Enhanced nonlinear double excitation of He in intense extreme ultraviolet laser fields.

Hishikawa A, Fushitani M, Hikosaka Y, Matsuda A, Liu CN, Morishita T, Shigemasa E, Nagasono M, Tono K, Togashi T, Ohashi H, Kimura H, Senba Y, Yabashi M, Ishikawa T. Hishikawa A, et al. Among authors: tono k. Phys Rev Lett. 2011 Dec 9;107(24):243003. doi: 10.1103/PhysRevLett.107.243003. Epub 2011 Dec 6. Phys Rev Lett. 2011. PMID: 22242995

7

Optical features of a LiF crystal soft X-ray imaging detector irradiated by free electron laser pulses.

Pikuz T, Faenov A, Fukuda Y, Kando M, Bolton P, Mitrofanov A, Vinogradov A, Nagasono M, Ohashi H, Yabashi M, Tono K, Senba Y, Togashi T, Ishikawa T. Pikuz T, et al. Among authors: tono k. Opt Express. 2012 Feb 13;20(4):3424-33. doi: 10.1364/OE.20.003424. Opt Express. 2012. PMID: 22418101 Free article.

8

A photodiode amplifier system for pulse-by-pulse intensity measurement of an x-ray free electron laser.

Kudo T, Tono K, Yabashi M, Togashi T, Sato T, Inubushi Y, Omodani M, Kirihara Y, Matsushita T, Kobayashi K, Yamaga M, Uchiyama S, Hatsui T. Kudo T, et al. Among authors: tono k. Rev Sci Instrum. 2012 Apr;83(4):043108. doi: 10.1063/1.3701713. Rev Sci Instrum. 2012. PMID: 22559516

9

Determination of the pulse duration of an x-ray free electron laser using highly resolved single-shot spectra.

Inubushi Y, Tono K, Togashi T, Sato T, Hatsui T, Kameshima T, Togawa K, Hara T, Tanaka T, Tanaka H, Ishikawa T, Yabashi M. Inubushi Y, et al. Among authors: tono k. Phys Rev Lett. 2012 Oct 5;109(14):144801. doi: 10.1103/PhysRevLett.109.144801. Epub 2012 Oct 1. Phys Rev Lett. 2012. PMID: 23083249

10

Soft x-ray free-electron laser imaging by LiF crystal and film detectors over a wide range of fluences.

Pikuz TA, Faenov AY, Fukuda Y, Kando M, Bolton P, Mitrofanov A, Vinogradov AV, Nagasono M, Ohashi H, Yabashi M, Tono K, Senba Y, Togashi T, Ishikawa T. Pikuz TA, et al. Among authors: tono k. Appl Opt. 2013 Jan 20;52(3):509-15. doi: 10.1364/AO.52.000509. Appl Opt. 2013. PMID: 23338201

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