Kinetics of electron attachment to SF3CN, SF3C6F5, and SF3 and mutual neutralization of Ar+ with CN- and C6F5(-)

Nicholas S Shuman; Thomas M Miller; A A Viggiano; Eddie D Luzik Jr; Nilay Hazari

doi:10.1063/1.3529423

Kinetics of electron attachment to SF3CN, SF3C6F5, and SF3 and mutual neutralization of Ar+ with CN- and C6F5(-)

J Chem Phys. 2011 Jan 28;134(4):044323. doi: 10.1063/1.3529423.

Authors

Nicholas S Shuman¹, Thomas M Miller, A A Viggiano, Eddie D Luzik Jr, Nilay Hazari

Affiliation

¹ Air Force Research Laboratory, Space Vehicles Directorate, Hanscom Air Force Base, Massachusetts 01731-3010, USA.

PMID: 21280741
DOI: 10.1063/1.3529423

Abstract

The additions of two sulfur fluoride derivatives (SF(3)C(6)F(5) and SF(3)CN) to a flowing afterglow were studied by variable electron and neutral density mass spectrometry. Data collection and analysis were complicated by the high reactivity of the neutral species. Both species readily dissociatively attach thermal electrons at 300 K to yield SF(3) + X(-) (X = C(6)F(5), CN). Attachment to SF(3)C(6)F(5) also results in SF(3)(-) + C(6)F(5) as a minor product channel. The determined electron attachment rate constants were 1(-0.6) (+1) × 10(-7) cm(3) s(-1) for SF(3)C(6)F(5), a lower limit of 1 × 10(-8) cm(3) s(-1) for SF(3)CN, and 4 ± 3 × 10(-9) cm(3) s(-1) for SF(3). Mutual neutralization rate constants of C(6)F(5)(-) and CN(-) with Ar(+) at 300 K were determined to be 5.5(-1.6) (+1.0) × 10(-8) and 3.0 ± 1 × 10(-8) cm(3) s(-1), respectively.