A self-propagating system for Ge incorporation into nanostructured silica

Aubrey K Davis; Mark Hildebrand

doi:10.1039/b804955f

A self-propagating system for Ge incorporation into nanostructured silica

Chem Commun (Camb). 2008 Oct 7:(37):4495-7. doi: 10.1039/b804955f. Epub 2008 Aug 4.

Authors

Aubrey K Davis¹, Mark Hildebrand

Affiliation

¹ Scripps Institution of Oceanography, University of California, San Diego, 9500 Gilman Dr, La Jolla, CA 92093-0202, USA.

PMID: 18802602
DOI: 10.1039/b804955f

Abstract

Technologically-relevant levels of Ge can be incorporated into cell wall silica of the diatom Thalassiosira pseudonana with no aberration in structure at low levels, whereas higher levels alter structure.

Publication types

Research Support, U.S. Gov't, Non-P.H.S.

MeSH terms

Diatoms / chemistry*
Germanium / chemistry*
Microscopy, Electron, Scanning
Nanostructures*
Silicon Dioxide / chemistry*

Substances

Germanium
Silicon Dioxide